Restoration of the Initial In-Depth Distribution of an Element from a Profile Measured by SIMS

Some advantages of the roughness–mixing–recoil (RMR) implantation model over the popular mixing–roughness–information (MRI) depth model proposed by Hoffman and with the Dowsett response function describing the depth resolution function for depth-profiling analysis by secondary-ion mass spectrometry are briefly reviewed. The problem of delta-layer shifts relative to the initial position in the process of depth-profiling analysis is also examined in detail.