Tailored electrochemical behavior of ta-C film by glancing angle deposition

Jing Wei,Peng Guo,Linlin Liu,Hanchao Li,Hao Li,Shuyuan Wang,Peiling Ke,Aiying Wang

Applied Surface Science（2020）

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摘要

•GAD of ta-C was realized by adjusting the filtered incident carbon ions.•GAD benefited a notable reduction of residual stress without distinct hardness loss.•The superior corrosion resistance of ta-C was obtained at glancing angle of 45°.•High sp3 content and enhanced hydrophobicity contributed to anti-corrosion.

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关键词

Glancing angle deposition,ta-C,Microstructure,Electrochemical corrosion

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