Alignment Tolerance Control of the Micro CPV Array Using Monte Carlo Methods
2019 IEEE 46th Photovoltaic Specialists Conference (PVSC)(2019)
摘要
Micro CPV is a promising technology for reducing high-precision assembly cost while making use of the high efficiency of CPV. A production method is often taken to manufacture small size modules with high accuracy, high homogeneity, low cost, and to compile them. There is a concern that the performance of the large-area panel may deteriorate due to accuracy in the assembly. We did the Monte Carlo analysis for simulate assemble error. It could successfully define inspection conditions and tolerance control thresholds with consideration of the worst-case of the tracking errors. With proper but reasonable inspections (component acceptance and alignment accuracy test), it is possible to collect micro-CPV units to a reasonable-size of the CPV panel keeping more than 90 % of the output even with the worst-case installation and tracking errors. This approach can be expanded to the analysis of impact by the partial shading of the lens that has a significant impact on the performance of CPV.
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关键词
micro-CPV,CPV,tolerance,process control,Monte Carlo method,partial shading,alignment
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