Microstructure Formation and Characterization of Nano-Tin Oxide Thin Films Prepared Using Different Concentration

Nano-SnO2 is a relatively important semiconductor material. Its crystal structure is unique rutile type. It has the advantages of high conductivity, high transparency and stable chemical properties. It is widely used in gas sensing detectors and solar cells for photoelectric conversion. Applications. In this paper, SnO2 nanofilms with different crystal structures were prepared by changing the three process parameters of salt concentration, reaction time and hydrothermal temperature in hydrothermal method. The samples were tested by scanning electron microscopy (SEM) and three-dimensional ultra-depth microscopy analyzer. As the concentration of the reaction solution increases, the macroscopic thickness of the film gradually thickens, and the three-dimensional structure of the surface changes from flat to coarse to coarse peak. The peak between the peaks first increases and then decreases, and the surface microstructure is The conditions change are not obvious. Through the comprehensive comparison of film integrity and surface area, it is found that the concentration is 0.03mol/L, which is relatively better.