Fabrication Of Polymeric Photonic Structures Using Dip-Pen Nanolithography

Zeev Fradkin, Marcos Roitman,Amos Bardea,Roy Avrahamy, Yeoshua Bery, Hanan Ohana,Moshe Zohar

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS(2020)

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摘要
Dip-pen nanolithography (DPN) is a low-cost, versatile, bench-top technology for direct patterning of materials over surfaces. Our study reports on the production of two-dimensional optical grating nanostructures based on polymers, using DPN. The influence of both the ink composition and the dwell time were investigated. Prototypes of phase masks were manufactured, and their main characteristics were analyzed. The results in our work may contribute to improving the fabrication process of optical structures, including the production of microlenses with controlled focal length. (C) 2020 Society of Photo-Optical Instrumentation Engineers (SPIE)
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关键词
dip-pen nanolithography, phase mask, PV cell
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