Resistive-nanoindentation: contact area monitoring by real-time electrical contact resistance measurement

In the past decades, efforts have been made to couple nanoindentation with resistive measurements in order to monitor the real-time contact area, as an alternative to the use of traditional analytical models. In this work, a novel and efficient stand-alone method is proposed to compute the contact area using resistive-nanoindentation of noble metals (bulk or thin films). This method relies on three steps: tip shape measurement, set-up calibration, application to the sample to be characterized. The procedure is applied to nanoindentation tests on a sample with film-on-elastic-substrate rheology and is successfully validated against experimental measurements of the contact area.