Development of two-layered ReRAM using Ga-Sn-O thin film
2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)(2019)
摘要
We have studied Resistive Random Access Memory (ReRAM) using Ga-Sn-O (GTO) thin film. The device fabricated in this study has a sandwich structure in which two layers of GTO thin films with different resistance values are sandwiched between electrodes. From the current-voltage characteristics of the fabricated device, it was possible to confirm the function as memory even if writing and erasing are repeated 400 times.
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关键词
two-layered ReRAM,Resistive Random Access Memory,sandwich structure,GTO thin films,current-voltage characteristics,GaSnO
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