Device-, Circuit- & Block-level evaluation of CFET in a 4 track library

2019 Symposium on VLSI Technology(2019)

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摘要
The structure of the complementary FET (CFET) with NMOS stacked on top of PMOS, inherently yields standard cells and SRAM cells with 25% smaller layout area, 25% higher pin density and 2× higher routing flexibility than FinFET with same overall active footprint. Moreover, our work, based on advanced modelling, demonstrates that 4 track CFET can match and even outperform 5 track FinFET; without the need to lower S/D contact resistivity down to 5e-10Ω.cm 2 or to elevate the channel stress up to 2GPa. All gains in power-performance-area at circuit-level are maintained at block-level, making 4 track CFET a suitable candidate for N3 & N2 technologies.
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关键词
power-performance-area,block-level evaluation,complementary FET,NMOS,PMOS,standard cells,SRAM cells,active footprint,advanced modelling,circuit-level evaluation,pin density,routing flexibility,track library,track FinFET,track CFET,S/D contact resistivity,device-level evaluation,N2 technologies,N3 technologies,pressure 2.0 GPa
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