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Self-Allancd Gate Contact (SAGC) for CMOS Technology Scaling Beyond 7Nm

2019 SYMPOSIUM ON VLSI TECHNOLOGY(2019)

引用 7|浏览67
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SAGC,CMOS technology scaling,gate contact scheme,superior process integration,SRAM cross-couple wiring,gate-contact,source-drain local interconnect,trapezoid-shaped oxide,source-drain region,growth process,upper level wiring,self-aligned gate contact
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