Influence of nodular defect size on metal dielectric mixed gratings for ultra-short ultra-high intensity laser system

With the development of the high power laser facilities, laser resistance of pulse compression grating is getting increased attention. The metal dielectric mixed grating (MDMG) is widely studied, because it has wide diffraction bandwidth, low surface stress and potential high threshold. The effect of nodular defect size on damage of MDMG is studied by experiments and theoretical analysis in two typical cases. The initial damages appear in the district of nodular defect due to local electric field enhancement induced by nodular defect, which is different with the initial damage located in grating pillar of the perfect MDMG. Laser induced ionization theory is introduced to describe the damage process and give a quantitative analysis on the relationship of laser damage and nodular defect size. It is concluded that local electric field enhancement in nodular defect area would cause the electron density to reach the critical value and lead to the damage occurrence, and nodule damage critical diameters are 1400 nm and 1500 nm respectively in case 1 (seed under the grating pillar) and case 2 (seed under the grating groove) which will lead to nodule damage initiation.