Single-Shot Few-Cycle Pulse Laser-Induced Damage And Ablation Of Hfo2/Sio2-Based Optical Thin Films

2019 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO)(2019)

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摘要
Few-cycle pulse laser damage and ablation of HfO2/SiO2-based single-, double-, and quad-layer thin films are studied using time-resolved surface microscopy. Ablation of multilayer samples happens as fast as for the single-layer, indicating a "blow-out" mechanism. (c) 2019 The Author(s)
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