Design Strategies for Rugged SiC Power Devices
2019 IEEE International Reliability Physics Symposium (IRPS)(2019)
摘要
This paper focuses on the design strategies for achieving adequate ruggedness of silicon carbide (SiC) metal-oxide-semiconductor field-effect transistors (MOSFETs). Currently available 1200 V MOSFETs from various vendors show a big variance in short circuit time, threshold voltage shift, and gate leakage currents. The short circuit (SC) test of three commercial TO-247 packaged MOSFETs with voltage ratings of 1200 V at room temperature show that the SC times are much lower than silicon devices. Threshold shifts under rated DC positive gate bias up to 100 hrs vary from 0.1 V to 0.5 V for different vendors. Fowler-Nordheim (FN) tunneling currents were measured as a function of gate bias and junction temperature. The FN gate leakage currents and temperature dependence are markedly different for various vendors. One vendor (for devices E and E’) stands out for best performance in all three respects.
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关键词
Short circuit,failure mechanisms,threshold voltage stability,Fowler-Nordheim tunneling,SiC- MOSFETs
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