Iii-V/Si Pics Based On Micro-Transfer-Printing

Gunther Roelkens,Jing Zhang,Grigorij Muliuk,Jeroen Goyvaerts,Bahawal Haq,Camiel Op de Beeck,Alexandros Liles,Zheng Wang,Sören Dhoore,Sulakshna Kumari,Joan Juvert,Joris Van Campenhout,Bart Kuyken,Dries Van Thourhout,Brian Corbett,Antonio Jose Trindade,Chris Bower,Roel Baets

2019 OPTICAL FIBER COMMUNICATIONS CONFERENCE AND EXHIBITION (OFC)（2019）

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Abstract

III-V opto-electronic devices (photodiodes, etched facet lasers) are micro-transfer-printed onto silicon waveguide circuits. An alignment-tolerant interface for evanescently-coupled devices is proposed enabling III-V/Si heterogeneously integrated PICs using micro-transfer-printing.

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Key words

silicon waveguide circuits,evanescently-coupled devices,microtransfer-printing,etched facet lasers,III-V optoelectronic devices,III-V-Si heterogeneously integrated PICs,photodiodes,alignment-tolerant interface,Si

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