Effects of low temperature buffer on carbon nano wall’s growth

Rupesh Singh,Toshio Kawahara,Yuhsuke Ohmi,Yasuhide Ohno,Kenzo Maehashi,Kazuhiko Matsumoto,Kazumasa Okamoto,Risa Utsunomiya,Masamichi Yoshimura

Materials Today Communications（2018）

引用 3|浏览17

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摘要

•Low temperature buffer (LTB) enhanced the uniformity of Carbon nano wall film.•The buffer layer reduced substrate’s edge effect on carbon nano wall’s growth.•LTB facilitated in increased size growth of carbon nano flakes.•LTB increased the metallic behavior in film grown at lower temperature.•Micron level line and space patterns can be used as electrode in transducers.

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关键词

Low temperature buffer,Carbon nano wall’s growth,Plasma-CVD process,Self-aligned growth,Substrate’s geometry

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