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Direct Growth of 5 in. Uniform Hexagonal Boron Nitride on Glass for High‐Performance Deep‐Ultraviolet Light‐Emitting Diodes

ADVANCED MATERIALS INTERFACES(2018)

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摘要
The direct coating of 2D hexagonal boron nitride (h-BN) on insulating solid glass will endow glass with advanced properties, thus offering killer applications of the new type hybrid of h-BN glass. However, daunting challenges still remain regarding the direct growth methodology of h-BN on glass. Herein, a catalyst-free chemical vapor deposition route for the direct synthesis of 5 in. uniform h-BN thin films on functional quartz and sapphire glass is developed. The optical transparency, surface wetting, and thermal conductivity of glass are readily tailored by varying the deposited h-BN thicknesses from monolayer to over 20 layers. Encouragingly, the as-obtained h-BN/sapphire glass can serve as a stress-releasing substrate for the van-der-Waals epitaxial growth of AlN functional layers, as well as a thermal conductive template for constructing high-performance deep-ultraviolet light-emitting diodes. This work hereby provides a brand new direction for the application of h-BN glass in next-generation solid-state lighting devices.
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关键词
hexagonal boron nitride,catalyst-free chemical vapor deposition,h-BN glass,epitaxial growth of AlN,deep-ultraviolet light-emitting diodes
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