Chemical Fixation Of So2 Using Norbornene With Different Side-Chain Groups And Control Of The Physical Properties Of Poly(Olefin Sulfone)
POLYMER INTERNATIONAL(2017)
摘要
Photoresists involving polymer solubility and degradation play a crucial role in the manufacture of integrated circuits by photolithography. Conventional photoresists typically rely on a single switching mechanism based on a change in either polarity or molecular weight of the polymer. Here we report a new type of poly(olefin sulfone) as a photoresist which overcomes the drawback of poor dry etching resistance, solubility and thermal degradation. The effects of different side-chain groups (acetyl, acetoxy and carboxylic acid) of norbornene on the properties of poly(norbornene sulfone)s were analyzed with the aim of developing a new type of photoresist. Thermogravimetry and gel permeation chromatography results revealed that bond breaking occurred at different temperatures, because of the different side-chain groups, and the three side-chain groups affect the solubility and stability of the poly(norbornene sulfone)s. A novel photoresist material based on a poly(olefin sulfone) with different side-chain groups was synthesized and its physical properties examined. (C) 2017 Society of Chemical Industry
更多查看译文
关键词
sulfur dioxide, norbornene derivatives, photodegradation, thermal stability, solubility
AI 理解论文
溯源树
样例
![](https://originalfileserver.aminer.cn/sys/aminer/pubs/mrt_preview.jpeg)
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要