Development of Improved n-μc-SiO$_x$ :H Films and Its Innovative Application in Silicon-Based Single Junction Thin Film Solar Cells

In this paper, we have discussed about the development of high-quality n-μc-SiO:H films by a seeding technique working as a potential back reflector layer (BRL). Highly crystalline and conducting n-μc-Si:H films are used as a seed layer. Phosphorous-doped SiOx:H film with suitable optoelectronics properties has been deposited by a radio frequency plasma enhanced chemical vapor deposition technique...