Wafer-Scale Selective-Area Deposition of Nanoscale Metal Oxide Features Using Vapor Saturation into Patterned Poly(methyl methacrylate) Templates (vol 3, 2016)

Patterned, chemically reactive poly(methyl) methacrylate can act as a chemical "sponge" via Lewis acid/base adduct formation with metal-organic reactants commonly used in atomic layer deposition. Extended reactant exposures saturate the reactant within the polymer, and subsequent oxidation removes the polymer and converts the saturated reactant to a metal oxide film that precisely mimics the lateral dimensions of the original polymer. Resulting oxide thickness scales with the starting polymer thickness. Regions without polymer are coated with less than 1 nm of metal oxide. Repeatable nanoscale features are formed simultaneously and uniformly across a 150 mm diameter silicon wafer.