A 300mm CMOS-Compatible PECVD Silicon Nitride Platform for Integrated Photonics with Low Loss and Low Process Induced Phase Variation

Sandeep S. Saseendran,Tangla D. Kongnyuy,Bruno Figeys, Federico Buja,Benedetto Troia,Sarp Kerman,Aleksandrs Marinins,Roelof Jansen,Xavier Rottenberg,Deniz S. Tezcan,Philippe Soussan

2019 Optical Fiber Communications Conference and Exhibition (OFC)（2019）

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摘要

Low loss PECVD silicon nitride waveguides at 905 nm (0.2 dB/cm) and 532 nm (1.36 dB/cm) wavelengths are reported. Efficacy of phase variation measurements for identifying process conditions for optical phased array fabrication is demonstrated.

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