Damping by Sequentially Tunneling Electrons
Surface Science(2018)
Abstract
•Damping caused by sequential tunneling through a Cl-vacancy on a NaCl film.•Damping depends on thickness of the NaCl film, tip position and tip-sample bias.•Features of current-induced damping explained by a rate-equation model.•Subfemtoampere tunneling currents are detected by the damping signal.•Maps of the damping signal can be used to inspect the tip shape.
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Key words
Atomic force microscopy,Scanning tunneling microscopy,Damping,Double-barrier tunnel junction,Thin insulating films,Atomic defects
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