Unzipping and movement of Lomer-type edge dislocations in Ge/GeSi/Si(0 0 1) heterostructures

Journal of Crystal Growth(2018)

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摘要
•Reversibility of edge dislocations formation in Ge/Si heterostructures is discovered.•The direct explanation of mobility of Lomer-type dislocation is offered.•Complementary 60° dislocations are separated in the movable edge dislocations.•The strain which remains in GeSi buffer layer is the driving force for separation.
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关键词
A1. Atomic scale microscopy,A1. Line defects,A1. Lomer dislocation,A1. Movable edge dislocation complex,A2. Molecular beam epitaxy,B1. Ge-on-Si
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