Multicomponent Diffusion in Metallic Systems Exposed to E-Beams

The paper is focused on selecting the optimal modes of Zr/Ti/Fe and Cu/Ni film-support systems treatment with LPHCEBs based on the numerical studies of diffusion mass transfer in a multilayered medium. The mode of alternate application of layers with exposure to an electron beam gives a more uniform profile of the concentration distribution in depth, since they experience a bigger amount of instances of electron exposure. The most preferable conditions are those that do not allow melting of film layers, while maintaining the film temperature high enough, close to melting temperature. The density of incident energy is 1.8-3 J/cm2.