Pattern transfer of hexagonal packed structure via ultrathin metal nanomesh masks for formation of Si nanopore arrays

We demonstrate that ultrathin Au nanomesh assisted in transferring pattern of hexagonal packed anodic aluminum oxide (AAO) membrane for formation of Si nanopore arrays. In this technology, the regularity of the AAO mask was inherited by the ultrathin Au nanomesh, which was pressed into the polymethyl methacrylate (PMMA) layer spin-coated on Si substrate. The fixed ultrathin Au nanomesh kept a close contact to the Si substrate through the PMMA layer. The pattern transfer of hexagonal packed AAO membrane to Si substrate was achieved using inductively coupled plasma (ICP) and highly orderly Si nanopore arrays were prepared in this work. Our technology improves the pattern fidelity and reduces defects.