Design and On-Wafer Characterization of $G$ -Band SiGe HBT Low-Noise Amplifiers
IEEE Transactions on Microwave Theory and Techniques(2016)
摘要
This paper presents the design and thorough on-wafer characterization of two G-band low-noise amplifiers (LNAs) implemented using 0.13-μm silicon-germanium (SiGe) heterojunction bipolar transistors (HBTs) with peak fT/fmax of 300/500 GHz. The impact of the substrate network and optimized via interconnections on the SiGe HBT performance is investigated to ensure that maximum performance is extracte...
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关键词
Silicon germanium,Heterojunction bipolar transistors,Noise measurement,Gain,Substrates,Impedance
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