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Performance and Variability Comparisons between ALD- and PVD-TiN Gate FinFET

T. Hayashida, K. Endo,Y. X. Liu, S. O'uchi, T. Matsukawa,W. Mizubayashi,S. Migita,Y. Morita,H. Ota,H. Hashiguchi,D. Kosemura, T. Kamei, J. Tsukada,Y. Ishikawa,H. Yamauchi,A. Ogura,M. Masahara

The Japan Society of Applied Physics（2011）

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pvd-tin
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