Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges

Vacuum(2018)

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摘要
Titanium carbon nitride (TiCN) films are prepared by reactive high power pulsed sputtering (HPPS) Penning discharges at a total pressure of 0.7 Pa and an average power of about 60 W, where the N2 fraction is 5%. The area ratio (RTC) of carbon target to the overall target is increased from 0 to 50%. This system can be regarded as a kind of double HPPS system with simultaneity. The peak value of the instantaneous power ranges between 3 and about 16 kW. It means that the peak power density range corresponds to 0.3–1.3 kWcm−2.
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关键词
Liquid Phase Sintering
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