Anisotropic conductivity enhancement in inclined W-Cu columnar films
Materials Letters(2018)
摘要
•W-Cu thin films are GLAD co-sputtered.•A dense structure is obtained at the film/substrate interface.•W-Cu Janus-like architectures are produced.•Wet chemical etching of Cu favors anisotropic resistivity.
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关键词
GLancing angle deposition,Co-sputtering,W-Cu thin film,Enhanced anisotropy,Resistivity,Wet chemical etching
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