Novel Technique For Production-Yield Enhancement Of Semiconductor Devices

Shiro Ninomiya,Yoji Kawasaki,Yasuharu Okamoto,Kazuhisa Ishibashi,Toshio Yumiyama,Akihiro Ochi,Yusuke Ueno,Hiroyuki Kariya, Mitsuaki Kabasawa,Mitsukuni Tsukihara

2018 IEEE 2ND ELECTRON DEVICES TECHNOLOGY AND MANUFACTURING CONFERENCE (EDTM 2018)（2018）

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摘要

One of the most important issues in semiconductor manufacturing is to suppress variation of characteristics in semiconductor devices within a wafer, in order to enhance production yield. In this report, an intentional two-dimensional (2D) non-uniform ion implantation system, named the "MIND System", is introduced and the effects of the system on suppression of some kind of variations are reviewed.

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关键词

Ion implantation, Intentional non-uniform pattern, Variability, Semiconductor manufacturing process control

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