Light Emission From Localised Point Defects Induced In Gan Crystal By Femtosecond-Pulsed Laser

Three different configurations of GaN are analysed to show robust and tunable light emitters from localised point defects induced in GaN crystal by a femtosecond laser (fs-laser). Localised irradiations of GaN are achieved using a fs-laser. The laser-induced damage threshold is found at a fluence of 130 +/- 10 mJ/cm(2). Raman spectroscopy allows for the characterization of irradiated GaN crystal while quasi-resonant photoluminescence mapping reveals a defect-related visible emission corresponding to the fs-laser irradiated area. From three different configurations of GaN, emission peaks vary from 620 to 680 nm-wavelengths for thin film, MBE intrinsically doped and Mg-doped NWs of GaN, respectively. The red emission in GaN is localized thanks to the new laser-induced fabrication and the engineering of the defect emission paves the way to further lighting applications. (c) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement