GIDL effect observed in FinFET shapes and Vt implant energy
2018 7th International Symposium on Next Generation Electronics (ISNE)(2018)
Abstract
The leakage of FinFETs with the different features and V
t
implant energy is observed and strongly related to the previous factors. Due to the process controllability, especially in photo-lithography, the multi-channel shape to promote the drive current seems not easy to be controlled well and deteriorates the desired target. The GIDL effect coming from the lower V
t
implant energy is more distinct than at the higher with the multi-channel FinFETs. However, this phenomenon was not apparently observed in the single FinFET.
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Key words
GIDL,FinFET,drive current,off-state current,VT implant energy
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