High-quality ZnO inverse opals and related heterostructures as photocatalysts produced by atomic layer deposition

•ZnO inverse opals were fabricated by atomic layer deposition using O3 as an oxidant.•Better crystal quality and photocatalytic performances when compared to common ALD.•ALD TiO2 by titanium tetrachloride was more suitable for 3D protection layers.•Alternative Al2O3 layers were inserted into the TiO2 layers for enhance anti-photo corrosion.•Heterostructured photonic crystals made of ZnO enhanced PEC performances.