Experimental Analysis of the Schottky Barrier Height of Metal Contacts in Black Phosphorus Field-Effect Transistors

JOURNAL OF PHYSICS D-APPLIED PHYSICS(2018)

引用 15|浏览6
暂无评分
摘要
Compared to graphene and MoS2, studies on metal contacts to black phosphorus (BP) transistors are still immature. In this work, we present the experimental analysis of titanium contacts on BP based upon the theory of thermionic emssion. The Schottky barrier height (SBH) is extracted by thermionic emission methods to analyze the properties of Ti-BP contact. To examine the results, the band gap of BP is extracted followed by theoretical band alignment by Schottky-Mott rule. However, an underestimated SBH is found due to the hysteresis in electrical results. Hence, a modified SBH extraction for contact resistance that avoids the effects of hysteresis is proposed and demonstrated, showing a more accurate SBH that agrees well with theoretical value and results of transmission electron microscopy and energy-dispersive x-ray spectroscopy.
更多
查看译文
关键词
black phosphorus,contact resistance,Schottky barrier height,MOSFET,metal contact
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要