Simulation of the Process of a Micro-components Fabrication for Vacuum Electronics and X-ray Optics Using Proton Beam Writing

A numerical simulation of the scanning process by a focused beam of 1 MeV protons in a proto. beam writing channel based on an electrostatic accelerator is carried out to select the dimensions of the deflecting plates of the electrostatic scanning system. The selection condition was the maximum value of scanning raster on the surface of the irradiated sample and minimization of the beam deflection along the optical axis. A program has been developed for constructing a scan profile by a beam that adequately reflects the pattern of the fabricated microcomponents. The process of preparation of samples with drawing of a thin layer of resistive material is fulfilled. Doses of irradiation of samples with a proton beam are determined to obtain conditions for complete etching of the irradiated region. Test experiments were carried out to check the operability of the scanning process by using control system.