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Spectral variation analysis for silicon grating couplers fabricated on a 300-mm SOI wafer

Tsuyoshi Horikawa,Daisuke Shimura,Jun Ushida,Yohei Sobu,Akemi Shiina,Masatoshi Tokushima,Seok-Hwan Jeong,Keizo Kinoshita,Tohru Mogami

2017 IEEE 14th International Conference on Group IV Photonics (GFP)（2017）

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Abstract
Spectral variation behavior for many grating couplers is experimentally investigated. It was found that the coupling wavelength is shifted by fabrication deviations in grating structure, and grating depth variation in 300-mm wafer processes is precisely derived by numerical analysis for coupling wavelength variation.
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Key words
silicon photonics,grating couplerss,fabrication deviation,wafer-level optical testing
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