Influence Of Substrate Materials On Deposition Of Plasma-Polymerized Sio:Ch Particles

Particles of silica with organic functional groups (SiO:CH) were synthesized by plasma-enhanced chemical vapor deposition with a trimethylmethoxysilane reactant, and the influence of substrate materials on deposition behaviors of the particles were investigated. The deposited films consist both of a uniform SiO:CH layer deposited on the substrates and of the SiO:CH particles or their aggregates on the layer surfaces. The spherical shape of the particles indicates that they are polymerized through a homogeneous nucleation process in vapor phase. Averaged particle diameters are almost same on any type of the substrate materials. On the other hand, the area densities of the particles on gold-coated glass or silicon substrates are much higher than that on a glass plate. Averaged particle number of an aggregate is also higher on the gold-coated substrates. These behaviors of the SiO:CH particles can be explained by electrical properties of the substrate materials.