Nanofabrication Limits in Layered Ferroelectric Semiconductors via He-ion Beam

Journal Article Nanofabrication Limits in Layered Ferroelectric Semiconductors via He-ion Beam Get access Holland Hysmith, Holland Hysmith Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Search for other works by this author on: Oxford Academic Google Scholar Alex Belianinov, Alex Belianinov Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Search for other works by this author on: Oxford Academic Google Scholar Matthew J Burch, Matthew J Burch Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Search for other works by this author on: Oxford Academic Google Scholar Anton V Ievlev, Anton V Ievlev Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Search for other works by this author on: Oxford Academic Google Scholar Vighter Iberi, Vighter Iberi Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831Department of Materials Science and Engineering, University of Tennessee, Knoxville, Knoxville TN 37996 Search for other works by this author on: Oxford Academic Google Scholar Michael A Susner, Michael A Susner Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Search for other works by this author on: Oxford Academic Google Scholar Michael A McGuire, Michael A McGuire Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Search for other works by this author on: Oxford Academic Google Scholar Peter Maksymovych, Peter Maksymovych Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Search for other works by this author on: Oxford Academic Google Scholar Marius Chyasnavichyus, Marius Chyasnavichyus Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Search for other works by this author on: Oxford Academic Google Scholar Stephen Jesse, Stephen Jesse Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Search for other works by this author on: Oxford Academic Google Scholar ... Show more Olga S Ovchinnikova Olga S Ovchinnikova Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 23, Issue S1, 1 July 2017, Pages 262–263, https://doi.org/10.1017/S1431927617001994 Published: 04 August 2017