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A Complete Methodology Towards Accuracy and Lot-To-Lot Robustness in On-Product Overlay Metrology Using Flexible Wavelength Selection

Kaustuve Bhattacharyya,Arie den Boef,Marc Noot,Omer Adam,Grzegorz Grzela,Andreas Fuchs,Martin Jak,Sax Liao,Ken Chang,Vincent Couraudon,Eason Su,Wilson Tzeng,Cathy Wang,Christophe Fouquet,Guo-Tsai Huang,Kai-Hsiung Chen,Y. C. Wang,Kevin Cheng,Chih-Ming Ke,L. G. Terng

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXI（2017）

Cited 9|Views11
Key words
Overlay,on-product,diffraction,DBO,scatterometer,metrology,accuracy,robustness,lot-to-lot,swin-gcurve.
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