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Application of Advanced Diffraction Based Optical Metrology Overlay Capabilities for High Volume Manufacturing

Kai-Hsiung Chen,Guo-Tsai Huang,Hung-Chih Hsieh, Wei-Feng Ni, S. M. Chuang, T. K. Chuang,Chih-Ming Ke,Jacky Huang, Shiuan-An Rao, Aysegul Cumurcu Gysen, Maxime d Alfonso, Jenny Yueh,Pavel Izikson,Aileen Soco,Jon Wu,Tjitte Nooitgedagt, Jeroen Ottens, Yong Ho Kim,Martin Ebert

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXI（2017）

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关键词
Metrology,Overlay,Scatterometry,Lithography,Multi-layer overlay
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