HfO 2 -Based Highly Stable Radiation-Immune Ferroelectric Memory

IEEE Electron Device Letters(2017)

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摘要
In this letter, HfO2-based ferroelectric random access memory (FeRAM) with metal-insulator-metal structure is studied for the first time under radiation conditions. V-doped HfO2-based FeRAM devices show high immunity to 60Co γ ray radiation. Basic FeRAM parameters, such as leakage current, permittivity, remanent polarization, endurance, and fatigue, show almost no degradation after γ ray radiation...
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关键词
Random access memory,Ferroelectric films,Nonvolatile memory,Hafnium compounds,Hysteresis,Electric fields,Capacitance-voltage characteristics
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