Lithographic Resolution Enhancement Of A Maskless Lithography System Based On A Wobulation Technique For Flow Lithography

We present a method for improving the lithographic resolution of digital micromirror devices for flow-lithography using a wobulation technique. While maintaining the area of UV exposure, the lithographic resolution was improved using a wobulation technique, which is a large screen display technique that enhances resolution via overlapping pixels by half a pixel. The edges of a diagonal pattern in a microstructure were smoothly generated with additional sub-patterns compared to conventional single pattern-exposure. In addition, the surface roughness of the microstructure was improved because the gaps between pixels were filled by the overlapping patterns. Published by AIP Publishing.