High-Reflectivity Duv Mirrors Prepared By Direct Sputtering

Hongjun Yang,Deyin Zhao,Shih-Chia Liu,Yonghao Liu,Jung-Hun Seo,Matt Hodek,Zhenqiang Ma,John D. Albrecht,Baxter Moody,Weidong Zhou

2016 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO)（2016）

引用 0|浏览16

暂无评分

摘要

We report here high-reflectivity multilayer DBR mirrors in 200-240 nm spectral region. YSZ (yttria-stabilized zirconia), HfO2 and SiO2 films were all prepared by direct RF magnetron sputtering. The film annealing conditions were systematically varied to obtain layers with minimal optical absorption. Combining these results, high reflectivity YSZ/SiO2 and HfO2/SiO2 DBRs were designed and realized with reflectance greater than 99.9%.

查看译文

关键词

reflectance,HfO2-SiO2 DBR,high reflectivity YSZ-SiO2,optical absorption,film annealing conditions,direct RF magnetron sputtering,SiO2 films,yttria-stabilized zirconia,spectral region,high-reflectivity multilayer DBR mirrors,direct sputtering,high-reflectivity DUV mirrors,wavelength 200 nm to 240 nm,HfO2-SiO2,ZrO2:Y2O3-SiO2

AI 理解论文

溯源树

样例

生成溯源树，研究论文发展脉络

Chat Paper

正在生成论文摘要