Determination Of Sputtering Yields For Quantitative In-Depth Analysis Of Surface-Layer Of Steels

Experiments were conducted to determine sputtering yields for various materials under a practical sputtering condition of Scanning Auger Microscopy (SAM) and Secondary Ion Mass Spectrometry (SIMS).(1) Sputtering yields for Al, Ti, Cr, Mn, Fe, Ni, Cu, Zn, W and Ta are obtained for Ar+ ions with bulk specimens. The experimental value of each element is larger than that calculated with semi-empirical formula for normal incidence of Ar+ ions.(2) Sputtering yields for Al, Cr, Mn, Fe and Ni are obtained for irradiation with O2+ ions and N2+ ions with bulk specimens.(3) Sputtering yields for Al, Cr, Mn, Fe, Ni and Cu are obtained for irradiation with Ar+ ions, O2+ ions and N2+ ions with film specimens evaporated on stainless steel. These values nearly agree to those obtained with polycrystalline bulk specimens for each element.(4) Sputtering yield of Fe-Ni alloy for Ar+ ions increases with Ni concentration up to 25.6 mass%.(5) Sputtering yield for Cr2O3 is obtained for Ar+ ions and O2+ ions with the specimen prepared by thermal oxidation of Cr-evaporated glass with known coating weight.Some of the results are applied to conversion of sputtering time to the sputtered amount in the depth-profiles. These results agree with those obtained with other techniques.