Fabrication And Application Of Phase Only Holograms For High Power Laser Beam Shaping

Fabrication of phase only holograms via spatially selective ablation of an ITO nanoparticulate layer coated on an optical quality transparent substrate appears to be very attractive due to the simplicity and flexibility of this approach. A pre-calculated binary pattern can be directly written on such a layer in order to produce a desired intensity distribution in the focal plane of a focusing lens. In this contribution we analyze the performance of the fabricated holograms and their suitability for high power beam shaping as well as propose a way to improve the diffraction efficiency of such structures by transitioning from a single to multi-layer holograms.