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High Chi Block Copolymer Dsa to Improve Pattern Quality for Finfet Device Fabrication

HsinYu Tsai,Hiroyuki Miyazoe,Ankit Vora,Teddie Magbitang,Noel Arellano,Chi-Chun Liu,Michael J. Maher,William J. Durand,Simon J. Dawes,James J. Bucchignano,Lynne Gignac,Daniel P. Sanders,Eric A. Joseph,Matthew E. Colburn,C. Grant Willson,Christopher J. Ellison,Michael A. Guillorn

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIII（2016）

引用 19|浏览110
关键词
directed self assembly,grapho-epitaxy,FinFET device,PS-PMMA,pitch scaling,high chi BCP
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