The effect of Ni:Si ratio on microstructural properties of Ni/Si ohmic contacts to SiC

Marek Wzorek,Michał A. Borysiewicz,A. Czerwinski,M. Myśliwiec,M. Ekielski,J. Ratajczak,A. Piotrowska,J. Kątcki

Applied Surface Science（2016）

Cited 6|Views24

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Abstract

•Ni/Si multilayer structures were deposited on 4H-SiC and subjected to the annealing.•Microstructure of Ni silicide layers was characterized.•Strong effect of initial Ni:Si ratio on ohmic contact's microstructure was observed.•Mechanisms influencing silicide-layer's microstructure were discussed.

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Key words

Ohmic contact,Silicon carbide,Nickel silicides,Microstructure

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