Real-time Etch Control to Reduce First Wafer Effect in SF6 /O2 /Ar Plasma
2018 International Symposium on Semiconductor Manufacturing (ISSM)(2018)
摘要
Real-time plasma controller for SF
6
/O
2
/Ar etching process plasma was developed to reduce first wafer effect caused by cleaning of plasma facing components. After the cleaning of the reactor, the etch rate of silicon decreased 12 % from the etch rate of normal state and increased with repeating etching processes. To reduce the first wafer effect, real-time feedback controller for fluorine density was developed. The controller adjusted O
2
gas flow rate to keep monitored fluorine density constant. With the controller, the etch rate of silicon after the cleaning was kept within 1 % variation.
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关键词
Fluorine,Plasmas,Silicon,Fluid flow,Etching,Cleaning,Process control
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