Aerosol-assisted chemical vapor deposition of WS 2 from the single source precursor WS(S 2 )(S 2 CNEt 2 ) 2 .

WS(S-2)(S2CNEt2)(2) has been successfully employed in the aerosolassisted chemical vapor deposition of WS2 at temperatures above 350 degrees C. This precursor was found to decompose primarily through the loss of H2S, CS2, and SCNEt. TheWS(2) deposits were characterized by scanning electron microscopy, X-ray photoelectron spectroscopy, Raman spectroscopy, and X-ray diffraction. The deposits exhibited plate-like structures growing vertically from the substrate.