Optical examination of high contrast grating fabricated by focused-ion beam etching

High refractive index contrast gratings (HCGs) with their extraordinary optical properties are very interesting candidates to substitute Distributed Bragg Reflectors as mirrors in optoelectronic semiconductor devices. In this work we present results of optical examination of a large scale HCG structure fabricated by focused-ion beam etching technique. The measured reflectance spectra exhibit a strong dependence on polarization of incident light, which confirms theoretical predictions. We also studied optical properties of a cavity formed by the HCG stacked on a wafer containing a VECSEL-like epitaxial structure.