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A New Approach to Determine Development Model Parameters by Employing the Isotropy of the Development Process

C. Kaspar,J. Butschke,M. Irmscher, S. Martens,J. N. Burghartz

Microelectronic Engineering（2017）

Cited 3|Views7
Key words
Electron beam lithography,Grayscale lithography,Isotropy of development process,Lateral development,Mack model
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