Fault isolation at P/N junction by nanoprober.
Microelectronics Reliability(2016)
Abstract
Precise location of leakage in a P-well/N-well junction has been identified by an AFM (atomic force microscope)-based nanoprober. In order to provide the accurate position of the failure for further analysis, a new method was proposed by combining nanoprobing I–V results on each P-well/N-well contact together with semi-empirical calculation to identify the possible leakage path. Further plan view TEM analysis confirms our result.
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Key words
AFM-based nanoprober,Failure analysis,Leakage,TEM
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